Metrology (PDT110/3)

This book presents the practical aspects of mass measurements. Concepts of gravitational, inertial and conventional mass and details of the variation of acceleration of gravity are described. The Metric Convention and International Prototype Kilogram and BIPM standards are described. The effect of change of gravity on the indication of electronic balances is derived with respect of latitude, altitude and earth topography. The classification of weights by OIML is discussed. Maximum permissible errors in different categories of weights prescribed by national and international organizations are presented. Starting with the necessity of redefining the unit kilogram in terms of physical constants, various methods of defining the kilogram in terms of physical constants are described. The kilogram can be defined by Avogadro "s constant, ion collection of some heavy elements, levitation, voltage and Watt Balance. The detection of very small mass of the order of zeptogram through Nanotechnolgy is also discussed. Latest recommendations of CIPM are given.

The field of large-scale dimensional metrology (LSM) deals with objects that have linear dimensions ranging from tens to hundreds of meters. It has recently attracted a great deal of interest in many areas of production, including the automotive, railway, and shipbuilding sectors.Distributed Large-Scale Dimensional Metrology introduces a new paradigm in this field that reverses the classical metrological approach: measuring systems that are portable and can be easily moved around the location of the measured object, which is preferable to moving the object itself. Distributed Large-Scale Dimensional Metrology combines the concepts of distributed systems and large scale metrology at the application level. It focuses on the latest insights and challenges of this new generation of systems from the perspective of the designers and developers. The main topics are:coverage of measuring area,sensors calibration,on-line diagnostics,probe management, andanalysis of metrological performance.The general descriptions of each topic are further enriched by specific examples concerning the use of commercially available systems or the development of new prototypes. This will be particularly useful for professional practitioners such as quality engineers, manufacturing and development engineers, and procurement specialists, but Distributed Large-Scale Dimensional Metrology also has a wealth of information for interested academics.

Dimensional metrology is an essential part of modern manufacturing technologies, but the basic theories and measurement methods are no longer sufficient for today's digitized systems. The information exchange between the software components of a dimensional metrology system not only costs a great deal of money, but also causes the entire system to lose data integrity.Information Modeling for Interoperable Dimensional Metrology analyzes interoperability issues in dimensional metrology systems and describes information modeling techniques. It discusses new approaches and data models for solving interoperability problems, as well as introducing process activities, existing and emerging data models, and the key technologies of dimensional metrology systems. Written for researchers in industry and academia, as well as advanced undergraduate and postgraduate students, this book gives both an overview and an in-depth understanding of complete dimensional metrology systems. By covering in detail the theory and main content, techniques, and methods used in dimensional metrology systems, Information Modeling for Interoperable Dimensional Metrology enables readers to solve real-world dimensional measurement problems in modern dimensional metrology practices.

The field of optical metrology offers a wealth of both practical and theoretical accomplishments, and can cite any number of academic papers recording such. However, while several books covering specific areas of optical metrology do exist, until the pages herein were researched, written, and compiled, the field lacked for a comprehensive handbook, one providing an overview of optical metrology that covers practical applications as well as fundamentals. Carefully designed to make information accessible to beginners without sacrificing academic rigor, the Handbook of Optical Metrology: Principles and Applications discusses fundamental principles and techniques before exploring practical applications. With contributions from veterans in the field, as well as from up-and-coming researchers, the Handbook offers 30 substantial and well-referenced chapters. In addition to the introductory matter, forward-thinking descriptions are included in every chapter that make this a valuable reference for all those involved with optical metrology.

Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs, this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay, acoustic film thickness, dopant dose, junction depth, and electrical measurements; particle and defect detection; and flatness following chemical mechanical polishing. Providing examples of well-developed metrology capability, the book focuses on metrology for lithography, transistor, capacitor, and on-chip interconnect process technologies.