Metrology and Quality Control (EPT 385/3)

Quality systems and standards have a significant impact on market access, export growth, productivity, industrial upgrading, diffusion of innovation, and other central ingredients for reducing poverty and enhancing country competitiveness. This book provides a comprehensive evaluation and blueprint for implementing quality systems for private sector development and trade and competition initiatives. By thoroughly analysing the diversity of institutions, linkages, and arrangements involved in quality systems and by identifying success factors in country quality strategies, this book provides a clear methodology on how to implement effective demand-driven national quality systems. It describes the necessary institutions and jurisdictions, the structure of required services and appropriate programs, the procedures and processes to be followed, the financing requirements and responsibilities, the incentive structure, and the relative roles of the public and private sector.

This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.

Measuring Technology and Mechatronics Automation in Electrical Engineering includes select presentations on measuring technology and mechatronics automation related to electrical engineering, originally presented during the International Conference on Measuring Technology and Mechanatronics Automation (ICMTMA2012). This Fourth ICMTMA, held at Sanya, China, offered a prestigious, international forum for scientists, engineers, and educators to present the state of the art of measuring technology and mechatronics automation research.

This book fulfills the global need to evaluate measurement results along with the associated uncertainty. In the book, together with the details of uncertainty calculations for many physical parameters, probability distributions and their properties are discussed. Definitions of various terms are given and will help the practicing metrologists to grasp the subject. The book helps to establish international standards for the evaluation of the quality of raw data obtained from various laboratories for interpreting the results of various national metrology institutes in an international inter-comparisons. For the routine calibration of instruments, a new idea for the use of pooled variance is introduced. The uncertainty calculations are explained for (i) independent linear inputs, (ii) non-linear inputs and (iii) correlated inputs. The merits and limitations of the Guide to the Expression of Uncertainty in Measurement (GUM) are discussed. Monte Carlo methods for the derivation of the output distribution from the input distributions are introduced. The Bayesian alternative for calculation of expanded uncertainty is included. A large number of numerical examples is included.

The purpose of the Fringe Proceedings is to present to engineers, scientists and industrial experts the state-of-the-art and the impact of Optical Metrology in Imaging, Surface Monitoring, Stress Analysis, Non-Destructive Testing, Quality Control, and related fields.Topics of particular interest are:New Methods and Tools for the Generation, Acquisition, Processing, and Evaluation of Data in Optical Metrology (Digital Wavefront Engineering)Application Enhanced Technologies in Optical Metrology (Addressing enhanced Resolution, Reliability and Flexibility)4D Optical Metrology over a Large Scale Range (from Macro to Nano)Hybrid Measurement Techniques (Sensor Fusion and the Unification of Modeling, Simulation and Experiment)New Optical Sensors and Measurement Systems for Industrial Inspection.Special emphasis is put on modern measurement strategies, taking into account the active combination of physical modelling, computer aided simulation and experimental data acquisition. Special emphasis is directed towards new approaches for the extension of existing resolution limits that open the gates to wide scale metrology, ranging from nano to macro, by using advanced optical sensor systems.